How is cut and chip wear influenced by the variation of the cross-link density within the conventional vulcanization system of natural rubber?

Abstract

This paper extends previous studies by the authors that aimed to describe the effect of apparent cross-link density (CLD) of the rubber polymer networks on the fracture mechanism caused by cut and chip (CC) wear of natural rubber (NR), demonstrating the positive effect of conventional vulcanization (CV). This work is focused on the determination of the effect of CLD while keeping constant the accelerator-to-sulfur ratio A/S = 0.2, typical for CV systems. For this ratio, different sulfur quantities were chosen, and the concentration of the accelerator N-tert-butyl-benzothiazole sulphonamide (TBBS) was calculated to achieve CLDs in a range from 35 to 524 μmol·cm–3. Standard analyses such as tensile tests, hardness, rebound resilience and DIN abrasion were performed. From these analyses, the optimum physical properties of the NR-based rubber were estimated to be in the CLD range of approximately 60 to 160 μmol·cm–3. A CC wear analysis was performed with an Instrumented cut and chip analyzer (ICCA) and it was found that the highest CC wear resistance of the NR is in the CLD range of 35 to 100 μmol·cm–3. Furthermore, the effect of strain-induced crystallization (SIC) of NR on CC wear and its dependence on the CLD region was discussed. For the first time, we determine a CLD range for a CV system in which the material achieves both optimal mechanical properties and CC wear resistance.