Characterization of epitaxial layers using scanning microwave microscopy

Martínek, Tomáš; Kudělka, Josef; Navrátil, Milan; Křesálek, Vojtěch

Title:	Characterization of epitaxial layers using scanning microwave microscopy
Author:	Martínek, Tomáš; Kudělka, Josef; Navrátil, Milan; Křesálek, Vojtěch
Document type:	Conference paper (English)
Source document:	Annals of DAAAM and Proceedings of the International DAAAM Symposium. 2015, vol. 2015-January, p. 1109-1114
ISSN:	1726-9679 (Sherpa/RoMEO, JCR)

ISBN:	978-3-902734-07-5
DOI:	https://doi.org/10.2507/26th.daaam.proceedings.156
Abstract:	In this article, atomic force microscopy and its variation scanning microwave microscopy were used for characterizatio of the epitaxial layers with different dopant doping levels specified by the manufacturing data. The vapour phase epitax was used for the deposition of individual layers on a silicon substrate. The measured data were visualized and compare with the manufacturing data.
Full text:	http://doi.org/10.2507/26th.daaam.proceedings.045
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Citace článku v konferenčním sborníku:
MARTÍNEK, Tomáš, Josef KUDĚLKA, Milan NAVRÁTIL a Vojtěch KŘESÁLEK. Characterization of epitaxial layers using scanning microwave microscopy. In: Annals of DAAAM and Proceedings of the International DAAAM Symposium [online]. Zadar: Danube Adria Association for Automation and Manufacturing, DAAAM, 2015, s. 1109-1114. [cit. 2024-11-24]. ISSN 1726-9679. Dostupné z: http://doi.org/10.2507/26th.daaam.proceedings.045.

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